| 简介 |
The present invention relates to a plasma resistant coating film and a forming method thereof, and more particularly, to a plasma resistant coating film capable of simultaneously ensuring a chemical resistant property by minimizing an open pore and an open channel of a coating layer with dual sealing through aerosol deposition and hydration treatment after the spray coating of a rare earth metal compound, and a plasma resistant property by a dense rare earth metal compound coating film, and a forming method thereof.COPYRIGHT KIPO 2017 |
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