| 简介 |
PROBLEM TO BE SOLVED : To provide a rare earth metal-transition metal alloy sputtering target capable of suppressing generation of particles during deposition by a sputtering method.SOLUTION : In a rare earth metal-transition metal alloy sputtering target comprising an alloy having a composition comprising a rare earth metal, a transition metal and inevitable impurities, the area ratio of vacancies in a sectional structure is 1% or more and 15% or less, and the maximum value of a circle equivalent diameter of vacancies is 50 μm or less.SELECTED DRAWING : NoneCOPYRIGHT : (C)2017, JPO&INPIT |
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