| 申请日期 | 2026-03-07 | 申请号 | US15413198 |
| 公开（公告）号 | US20170130319A1 | 公开（公告）日 | 2017-05-11 |
| 公开国别 | US | 申请人省市代码 | 全国 |
| 申请人 | Applied Materials Inc | ||
| 简介 | A method of manufacturing an article comprises performing ion assisted deposition (IAD) to deposit a protective layer on at least one surface of the article, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less. | ||
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