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Method of manufacturing optical element 发明授权

2023-02-20 3420 154K 0

专利信息

申请日期 2025-07-01 申请号 JP2013162076
公开(公告)号 JP6086321B2 公开(公告)日 2017-03-01
公开国别 JP 申请人省市代码 全国
申请人 日本電信電話株式会社; 国立大学法人北海道大学
简介 PROBLEM TO BE SOLVED : To suppress lowering of luminous efficiency in an optical element using a rare earth compound.SOLUTION : A substrate including a silicon layer 103 cleaned by RCA cleaning is carried in a processing chamber of ultrahigh vacuum of about 1×10Pa, for example, and cleaned by heating up to a temperature of 1000°C or more. Subsequently, it is cooled down to a growth temperature of 700°C. Thereafter, on the principal surface of the silicon layer 103, a material containing rare earth composed of an oxide of rare earth is grown epitaxially in the growth temperature of 700°C by physical vapor deposition, thus forming a light functional layer 104 of single crystal composed of a material containing rare earth.


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