| 简介 |
PROBLEM TO BE SOLVED : To provide a positive-type radiation-sensitive resin composition capable of forming a cured film excellent in storage stability and in addition, sufficiently satisfying general characteristics such as sensitivity, developing adhesion, heat resistance, chemical resistance, transmittance and dielectric constant while retaining good surface hardness.SOLUTION : The positive-type radiation-sensitive resin composition comprises : [A] a polymer having a structural unit (I) containing at least one selected from the group comprising groups represented by formula (1) mentioned below and groups represented by formula (2) mentioned below and a structural unit (II) containing a cyclic ether structure or a cyclic carbonate structure; and [B] an acid generator. In the formula (1) mentioned below, Rand Rare each independently a hydrogen atom, a 1-4C alkyl group or a 1-4C fluorinated alkyl group. In the formula (2) mentioned below, Rand Rare each independently a hydrogen atom, a halogen atom, a 1-4C alkyl group or a 1-4C fluorinated alkyl group. |
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