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ULTRAVIOLET GENERATION TARGET AND METHOD OF MANUFACTURING THE SAME 发明申请

2023-04-17 1320 485K 0

专利信息

申请日期 2025-09-15 申请号 JP2015118186
公开(公告)号 JP2017004789A 公开(公告)日 2017-01-05
公开国别 JP 申请人省市代码 全国
申请人 HAMAMATSU PHOTONICS KK
简介 PROBLEM TO BE SOLVED : To provide an ultraviolet generation target capable of enhancing extraction efficiency of ultraviolent light and also to provide a method of manufacturing the same. SOLUTION : An ultraviolet generation target 1A includes : a sapphire substrate 21 through which ultraviolet light UV passes; an intermediate layer 22 which is in contact with the sapphire substrate 21, which includes an oxygen atom and an aluminum atom in a composition and through which ultraviolet light passes; and a light-emitting layer 23 which is provided on the intermediate layer 22, which includes oxide crystal containing rare earth to which an activator is added and which receives electron beams EB to generate ultraviolet light UV. SELECTED DRAWING : Figure 2 COPYRIGHT : (C)2017, JPO&INPIT


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