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METAL OXIDE SEMICONDUCTOR THIN FILM, THIN-FILM-TRANSISTOR, AND THEIR FABRICATING METHODS, AND DIS 发明申请

2023-04-26 1870 1217K 0

专利信息

申请日期 2025-06-27 申请号 WOCN15096946
公开(公告)号 WO2017000503A1 公开(公告)日 2017-01-05
公开国别 WO 申请人省市代码 全国
申请人 BOE TECHNOLOGY GROUP CO LTD; SOUTH CHINA UNIVERSITY OF TECHNOLOGY
简介 A metal oxide semiconductor thin film, a thin film transistor (TFT), methods for fabricating the metal oxide semiconductor thin film and the TFT, and a display apparatus are provided. In some embodiments, the metal oxide semiconductor comprises : a first metal element, a second metal element and a third metal element, wherein : the first metal element is at least one of scandium, yttrium, aluminum, indium, and a rare earth element; the second metal element is at least one of calcium, strontium, and barium; and the third metal element is at least one of titanium and tin.


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