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A photosensitive resin composition for forming a spacer, a spacer, a display device, and a method 发明授权

2023-06-30 4870 365K 0

专利信息

申请日期 2025-06-24 申请号 JP2012174279
公开(公告)号 JP6041571B2 公开(公告)日 2016-12-07
公开国别 JP 申请人省市代码 全国
申请人 東京応化工業株式会社
简介 PROBLEM TO BE SOLVED : To provide a photosensitive resin composition for forming a spacer which easily forms a spacer with a small diameter, even when the spacer is formed by using a proximity exposure apparatus, and to provide a spacer formed from the photosensitive resin composition, a display device provided with the spacer, and a method for forming a spacer using the photosensitive resin composition.SOLUTION : The photosensitive resin composition for forming a spacer contains an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a compound represented by expression (1). In the expression, Rand Reach independently represent a hydrogen atom or an organic group, and at least one of Rand Rrepresents an organic group; Rand Rmay be bonded to each other to form a cyclic structure, and may include a bond of hetero atoms; Rrepresents a single bond or an organic group; Rto Reach independently represent a hydrogen atom, an organic group and the like, and Rand Rare not a hydroxyl group; and Rrepresents a hydrogen atom or an organic group.


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