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A photosensitive resin composition for black column spacer, black column spacer, display device, 发明授权

2023-01-06 3180 415K 0

专利信息

申请日期 2025-07-19 申请号 JP2012174874
公开(公告)号 JP6041572B2 公开(公告)日 2016-12-07
公开国别 JP 申请人省市代码 全国
申请人 東京応化工業株式会社
简介 PROBLEM TO BE SOLVED : To provide a photosensitive resin composition from which a black column spacer that gives a sufficient height difference can be formed in a process of carrying out exposure through a halftone mask, and to provide a black column spacer formed by using the composition, a display device having the black column spacer, and a method for forming a black column spacer using the composition.SOLUTION : A composition comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, a compound expressed by a formula (1), and a light shielding agent. In the formula, Rand Rrepresent a hydrogen atom or an organic group and at least one of them represents an organic group; Rand Rmay be bonded to each other to form a cyclic structure or may include a hetero atom bond; Rrepresents a single bond or an organic group; Rto Rrepresent a hydrogen atom, an organic group or the like, however, it is not allowed that both of Rand Rare hydroxyl groups; and Rrepresents a hydrogen atom or an organic group.


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