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A sputtering target for a rare earth magnet and method of manufacturing same 发明授权

2023-08-12 4640 1148K 0

专利信息

申请日期 2025-08-25 申请号 JP2013052642
公开(公告)号 JP6030009B2 公开(公告)日 2016-11-24
公开国别 JP 申请人省市代码 全国
申请人 JX金属株式会社
简介 PROBLEM TO BE SOLVED : To provide a sintered compact target excellent in mass productivity and reproducibility, and useful for forming a rare earth magnet thin film having excellent magnetic properties, especially a neodymium magnet thin film, and to provide a production method thereof.SOLUTION : In a target for forming a rare earth magnet containing neodymium, iron and boron (or ferroboron) as essential components, the area ratio of a NdFeB phase is 61% or higher, the area ratio of an α-Fe phase is 8% or lower, and the residual part is constituted of a NdFeBphase (where, 11.9


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