客服热线:18202992950

GAS NOZZLE, MANUFACTURING METHOD OF GAS NOZZLE, AND PLASMA TREATMENT DEVICE 发明申请

2023-03-06 4710 693K 0

专利信息

申请日期 2025-07-24 申请号 US17296052
公开(公告)号 US20220020563A1 公开(公告)日 2022-01-20
公开国别 US 申请人省市代码 全国
申请人 KYOCERA Corporation
简介 A gas nozzle according to the present disclosure includes a supply hole having a tubular shape and configured to guide a gas and an injection hole connecting to the supply hole. The gas nozzle configured to inject the gas from the injection hole is made from ceramics or single crystal including an oxide, a fluoride, or an oxyfluoride of a rare earth element or an yttrium aluminum composite oxide as a primary component. An arithmetic mean roughness Ra of an inner circumferential surface forming the supply hole is smaller on an outflow side than on an inflow side of the gas.


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4