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Ag ALLOY SPUTTERING TARGET 发明申请

2023-02-15 3610 361K 0

专利信息

申请日期 2025-07-30 申请号 KR1020167023358
公开(公告)号 KR1020160106184A 公开(公告)日 2016-09-09
公开国别 KR 申请人省市代码 全国
申请人 KOBE STEEL LTD
简介 The present invention provides an Ag alloy film which exhibits a low-level electrical resistivity nearly equivalent to that of a pure Ag film and which is superior to a conventional Ag alloy film in durability (specifically, resistances to salt water and halogen) and in the adhesion to a substrate. Further, the deposition rate of this Ag alloy film by sputtering is as high as that of a pure Ag film. Provided is an Ag alloy film useful as a reflecting film and/or a transmitting film or as an electrical wiring and/or an electrode, including 0.1 to 1.5 atomic % of at least one element selected from Pd, Au and Pt, and 0.02 to 1.5 atomic % of at least one element selected from at least one rare earth element, Bi and Zn with the balance being Ag and inevitable impurities.


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