| 简介 |
PROBLEM TO BE SOLVED : To provide a salt capable of obtaining a resist pattern having excellent focus margin, to provide an acid generator, and to provide a resist composition etc.SOLUTION : The salt is represented by formula (I) [wherein, Ris hydroxy or alkyl; Rand Rare each H or alkyl; l is an integer of 0-3; m and n are each 1 or 2; Ris H or alkyl; o is 0 or 1; Rand Rare each a fluorine atom or perfluoroalkyl; Lis a bivalent saturated hydrocarbon group; Y is a (substituted) aliphatic hydrocarbon group or (substituted) alicyclic hydrocarbon group]. |
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