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In the method of reducing the residual halides Organoxysilane 发明授权

2023-05-05 3800 112K 0

专利信息

申请日期 2025-07-26 申请号 JP2012252055
公开(公告)号 JP5978940B2 公开(公告)日 2016-08-24
公开国别 JP 申请人省市代码 全国
申请人 信越化学工業株式会社
简介 PROBLEM TO BE SOLVED : To provide a method for decreasing residual halides in organooxysilane, in which high-purity organooxysilane can be produced without forming halide-derived by-products.SOLUTION : The method for decreasing residual halides in organooxysilane comprises the steps of : reacting silane halide with alcohol to obtain the organooxysilane shown by the following formula (1) (Rand Rare each a monovalent hydrocarbon group; a is an integer of 1-3); adding alcohol to a mixture, which includes the silane halide being a by-product at the reacting step and the hydrogen halide-containing residual halides generated at the reaction step, while refluxing a solvent to react the added alcohol with the silane halide in the residual halides and form the organooxysilane shown by the following formula (2) (Rand Rare the same as mentioned above; Ris a monovalent hydrocarbon group; b is an integer of 1-3; c is an integer of 1-2; b+c is an integer of 1-3); and distilling off excess alcohol including the hydrogen halide.


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