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Aluminum nitride sintering and semiconductor maintenance 发明授权

2023-11-09 4660 1824K 0

专利信息

申请日期 2026-04-26 申请号 KR1020197034104
公开(公告)号 KR102347643B1 公开(公告)日 2022-01-06
公开国别 KR 申请人省市代码 全国
申请人 교세라 가부시키가이샤
简介 Aluminum nitride sintering body 1 is a crystal particles (2) of aluminum nitride comprising Mg, and has a gannet-type crystal structure, a composite oxide comprising a rare earth element and Al, and a complex oxide comprising Mg and Al. Between the crystal particles 2 of aluminum nitride is dotted with particles 3 of the composite oxide and particles 4 of the composite oxide. Composite oxides may contain Y. Crystal particles (2) of aluminum nitride may be less than 1.0mol% or more of the content of Mg when referred to as 100mol% of the entire metal element containing. The semiconductor maintenance device is provided with an aluminum nitride sintered body 1 and a electrostatic adsorption electrode 13.


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