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Compound, a polymeric compound, an acid generator, resist composition, resist pattern forming me 发明授权

2023-07-10 3740 1144K 0

专利信息

申请日期 2026-04-24 申请号 JP2012046935
公开(公告)号 JP5948090B2 公开(公告)日 2016-07-06
公开国别 JP 申请人省市代码 全国
申请人 東京応化工業株式会社
简介 PROBLEM TO BE SOLVED : To provide a new compound, a polymer compound and use methods thereof.SOLUTION : There is provided a compound of formula (1-1), where in the formula, Yand Yare each independently a single bond or a bivalent linking group; Rand Rare each independently a hydrocarbon group which may have a substituent or a group represented by formula (1-2), where at least either thereof is a group represented by formula (1-2); Vis an optionally substituted 1-4C fluorinated alkylene group; Mis an m-valent counter cation; and m is an integer of 1 to 3.


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