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FARADAY ROTATOR, AND MANUFACTURING METHOD OF THE SAME 发明申请

2023-03-10 2090 60K 0

专利信息

申请日期 2025-08-29 申请号 JP2014140476
公开(公告)号 JP2016018071A 公开(公告)日 2016-02-01
公开国别 JP 申请人省市代码 全国
申请人 SUMITOMO METAL MINING CO LTD
简介 PROBLEM TO BE SOLVED : To provide a Faraday rotator and a manufacturing method of the Faraday rotator that suppress the increase of the insertion loss even when it is incorporated in an optical isolator for a high-output laser of a wavelength of 1.1 μm or less and an output of 5 W or more, and also suppress the peeling of an RIG film and a sapphire substrate for heat radiation. SOLUTION : In the Faraday rotator, a sapphire substrate for heat radiation is disposed on each of both surface sides of a bismuth-substituted type rare-earth iron garnet film (RIG film) produced by a liquid phase epitaxial method. Bonded surfaces of the sapphire substrates 2 and 2 for heat radiation to the RIG film 1 are mirror-polished. The RIG film is directly bonded to the sapphire substrates for heat radiation by a surface-activation room-temperature bonding method without using an adhesive agent. An antireflection film is not disposed on the bonded surfaces of the sapphire substrates for heat radiation to the RIG film. SELECTED DRAWING : Figure 1 COPYRIGHT : (C)2016, JPO&INPIT


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