| 申请日期 | 2025-06-29 | 申请号 | JP2020515086 |
| 公开（公告）号 | JP6980101B2 | 公开（公告）日 | 2021-12-15 |
| 公开国别 | JP | 申请人省市代码 | 全国 |
| 申请人 | KOMICO CO LTD | ||
| 简介 | The present invention relates to a member for a plasma etching device and a method of manufacturing the same, and more particularly to a member for a plasma etching device, which is improved in plasma resistance through deposition of a rare-earth metal thin film and surface heat treatment and the optical transmittance of which is maintained, thus being useful as a member for analyzing the end point of an etching process, and a method of manufacturing the same. | ||
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