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The oxide and manganese oxide thin film laminate 发明授权

2023-07-30 2780 264K 0

专利信息

申请日期 2025-06-25 申请号 JP2013554203
公开(公告)号 JP5835354B2 公开(公告)日 2015-12-24
公开国别 JP 申请人省市代码 全国
申请人 HITACHI MAXELL
简介 The present invention provides a thin film or laminate which ensures switching capabilities by phase transition of Mott transition at room temperature. An embodiment of the present invention provides a manganese oxide thin film 2 formed on a plane of a substrate 1 and having a composition represented by a composition formula RMnO3 (where R is at least one trivalent rare earth element selected from lanthanoids), wherein an atomic layer containing an element R and not containing Mn and an atomic layer containing Mn and not containing the element R are alternately stacked along a direction perpendicular to the plane of the substrate, and the manganese oxide thin film has two nonequivalent crystal axes along an in-plane direction of the plane of the substrate. An aspect of the present invention also provides an oxide laminate having the manganese oxide thin film 2 of the above aspect to which strongly-correlated oxide thin film 3, 31 or 32 are formed contiguously.


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