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RE123 CRYSTAL FILM FORMING METHOD 发明申请

2023-04-12 4790 142K 0

专利信息

申请日期 2026-04-25 申请号 JP2014092661
公开(公告)号 JP2015209363A 公开(公告)日 2015-11-24
公开国别 JP 申请人省市代码 全国
申请人 SHIMANE UNIV
简介 PROBLEM TO BE SOLVED : To provide a RE123 crystal film forming method that can form film at lower temperature and at higher speed compared to the conventional vapor phase epitaxial method, and that does not require vacuum environment. SOLUTION : Provided is a crystal film forming method for film-growing rare earth-based copper oxide high temperature superconductor REBa2Cu3Oy (where, RE represents a rare earth element, and y represents 6 to 7.) on a substrate, and in which, characterized, by dissolving a raw material adjusted such that the composition ratio of RE : Ba : Cu is between 1 : 2 to 3 : 2 to 7, into fused hydroxide (fused hydroxide method), REBa2Cu3Oy is film-grown on a substrate in a reducing atmosphere of exceeding 500°C and less than 700°C. COPYRIGHT : (C)2016, JPO&INPIT


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