| 简介 |
To provide an article (such as a lid and/or nozzle) for an etch reactor having a thin film protective layer on one or more plasma facing surfaces of the article.SOLUTION : A method of manufacturing an article comprises the step for providing a lid or nozzle for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the lid or nozzle, where the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less.SELECTED DRAWING : Figure 6 |
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