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Sputtering Target for Rare-Earth Magnet and Production Method Therefor 发明申请

2023-02-18 2790 263K 0

专利信息

申请日期 2025-07-10 申请号 US14425083
公开(公告)号 US20150262752A1 公开(公告)日 2015-09-17
公开国别 US 申请人省市代码 全国
申请人 JX Nippon Mining Metals Corporation
简介 The present invention relates to a rare-earth magnetic target comprising neodymium, iron, and boron as essential components. The target has an average crystal grain diameter of 10 to 200 μm. It is an object of the present invention to provide a sintered compact target that can form rare-earth magnetic thin films, in particular, neodymium magnetic thin films, having good magnetic characteristics with excellent mass productivity and reproducibility, and provide a method of producing the sintered compact target.


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