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THIN FILM TRANSISTOR STRUCTURE, THIN FILM TRANSISTOR MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE 发明申请

2023-12-19 2080 353K 0

专利信息

申请日期 2025-06-26 申请号 JP2014016632
公开(公告)号 JP2015144173A 公开(公告)日 2015-08-06
公开国别 JP 申请人省市代码 全国
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE
简介 PROBLEM TO BE SOLVED : To provide a thin film transistor which is excellent in preventing diffusion of an impurity from a substrate to a semiconductor layer and inhibits deterioration in characteristics caused by the diffusion of the impurity. SOLUTION : A thin film transistor 10 comprises : a source electrode 60 and a drain electrode 70; a semiconductor layer 50 provided in contact with the source electrode and the drain electrode; a gate electrode 30 provided to correspond to a channel between the source electrode and the drain electrode; and insulator layers 41, 42 provided between the gate electrode and the semiconductor layer. The insulator layer is composed of a metal oxynitride containing Hf and a rare earth element, especially La. COPYRIGHT : (C)2015, JPO&INPIT


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