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METHOD FOR MAKING QUANTUM DOT 发明授权

2023-11-01 2020 921K 0

专利信息

申请日期 2025-06-25 申请号 KR1020080134136
公开(公告)号 KR101518423B1 公开(公告)日 2015-04-30
公开国别 KR 申请人省市代码 全国
申请人 INDUSTRY ACADEMIC COOPERATION FOUNDATION YONSEI UNIVERSITY
简介 PURPOSE : A method for making quantum dots is provided to create quantum dots regardless of the lattice constant difference between a first thin film and a semiconductor substrate. CONSTITUTION : An epitaxial layer(20) is formed on a semiconductor substrate(10). A strain(25) is formed by the difference of crystalline structure between the epitaxial layer and the semiconductor substrate. A first thin film(30) whose lattice constant is different from the epitaxial layer is formed on the epitaxial layer. Voids(40) are created by doping rare earth element or IV-element in the first thin film. Quantum dots(50) are formed around the voids by heat-treating the first thin film.


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