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Aluminum nitride single crystal forming polygonal columns and a process for producing a plate-shaped 发明授权

2023-10-19 2640 440K 0

专利信息

申请日期 2025-07-11 申请号 US12743703
公开(公告)号 US8921980B2 公开(公告)日 2014-12-30
公开国别 US 申请人省市代码 全国
申请人 Hiroshi Amano; Yukihiro Kanechika; Masanobu Azuma
简介 An aluminum nitride single crystal in the form of polygonal columns, the polygonal columns having the following properties [a] to [c] : [a] the content of a metal impurity is below a detection limit, [b] the average bottom area is from 5×103 to 2×105 μm2, and [c] the average height is 50 μm to 5 mm. The above aluminum nitride single crystal is preferably obtainable in a method including the steps of sublimating an aluminum nitride starting material (A) containing 0.1 to 30% by mass of a rare earth oxide by heating the starting material at a temperature of not lower than 2000° C., depositing aluminum nitride on a hexagonal single crystal substrate and thereby growing aluminum nitride single crystal in the shape of polygonal columns.


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