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The method of forming the film ZnO 发明授权

2023-10-30 1200 227K 0

专利信息

申请日期 2025-07-19 申请号 JP2009061324
公开(公告)号 JP5632135B2 公开(公告)日 2014-11-26
公开国别 JP 申请人省市代码 全国
申请人 Mitsubishi Materials Corp6264
简介 PROBLEM TO BE SOLVED : To provide a ZnO deposited film in which the productivity of film deposition is high, volume resistivity is low, and also, the increase of the volume resistivity is suppressed in a high moisture environment, and to provide a method for depositing the film. SOLUTION : A ZnO sintered compact containing 0.1 to 15 mass% rare earth elements is used for a vapor deposition material, and film deposition is performed by a reactive vapor deposition process in an oxygen gas flow rate of 0 to 500 sccm and at a film deposition rate of 0.5 to 5.0 nm/s, so as to deposit a ZnO film having high moisture resistance. The rare earth elements are preferably at least one kind selected from Sc, Y, La, Ce, Pr, Nd, Pm and Sm. COPYRIGHT : (C)2010, JPO&INPIT


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