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Plasma 发明授权

2022-12-27 3820 559K 0

专利信息

申请日期 2025-06-27 申请号 JP2010226398
公开(公告)号 JP5587126B2 公开(公告)日 2014-09-10
公开国别 JP 申请人省市代码 全国
申请人 Panasonic Corporation5821
简介 PROBLEM TO BE SOLVED : To provide means that obtains a protection film that has a good low voltage characteristic and sufficient insulation quality capable of accumulating an electric charge and has strength for alteration in a process of PDP manufacturing atmosphere in view of a protection film material. SOLUTION : An oxide of rare earth metal with ionic valence of trivalent as a protection film material is used. A protection film is formed so that the atomic radius of a metal oxide is 180 pm or more to 205 pm or less, and for example, one kind of lanthanum oxide, europium oxide, and ytterbium oxide is used as the metal oxide. COPYRIGHT : (C)2012, JPO&INPIT


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