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ABRASIVE AND POLISHING METHOD 发明申请

2023-10-01 4310 62K 0

专利信息

申请日期 2025-07-08 申请号 JP2013011558
公开(公告)号 JP2014140936A 公开(公告)日 2014-08-07
公开国别 JP 申请人省市代码 全国
申请人 ADMATECHS CO LTD; RITSUMEIKAN; CRYSTAL KOGAKU : KK
简介 PROBLEM TO BE SOLVED : To provide an abrasive which does not use an abrasive grain including a rare earth element such as a cerium oxide abrasive grain, and secures polishing performance (polishing rate and surface roughness) which is equivalent to a case where the cerium oxide abrasive grain is used.SOLUTION : The abrasive includes : an abrasive grain of which main constituent is zirconium oxide (ZrO2); and a polishing assistant which includes a bivalent iron. The polishing assistant is an iron compound such as iron sulfate (II) or iron chloride (II). A content percentage of the assistant (Ma/Mg) that is a mass ratio of the polishing assistant content (Ma) to the abrasive grain content (Mg), is preferably 0.01-0.7. Improvement of polishing performance by use of the polishing assistant is attributable to a mild acidity and a reducibility developed by Fe2+.COPYRIGHT : (C)2014, JPO&INPIT


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