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ABRASIVE AND POLISHING METHOD 发明申请

2023-07-06 2290 71K 0

专利信息

申请日期 2026-04-20 申请号 JP2013011559
公开(公告)号 JP2014140937A 公开(公告)日 2014-08-07
公开国别 JP 申请人省市代码 全国
申请人 ADMATECHS CO LTD; RITSUMEIKAN; CRYSTAL KOGAKU : KK
简介 PROBLEM TO BE SOLVED : To provide an abrasive which does not use an abrasive grain including a rare earth element like a cerium oxide abrasive grain and secures polishing performance (polishing rate and surface roughness) which is equivalent to a case where the cerium oxide abrasive grain is used.SOLUTION : The abrasive includes : an abrasive grain of which main constituent is zirconium oxide (ZrO2); and a polishing assistant composed of metallic salt. A content percentage of the assistant (Ma/Mg) that is a mass ratio of the polishing assistant content (Ma) to the abrasive grain content (Mg), is preferably 0.1-2. Polishing performance is improved by the presence of a suitable amount of the metallic salt in the abrasive grain. A reason for this is that ionic concentration in the slurry is raised by the salting-out effect of the metallic salt, charge balance on the surface of the abrasive grain is lost, so that particles are loosely aggregated with each other, and the abrasive grain consisting of zirconium oxide is easily retained in the abrasive pad.COPYRIGHT : (C)2014, JPO&INPIT


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