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GaN substrate [...] cushioning structure and devices for use in 发明申请

2023-09-26 4010 210K 0

专利信息

申请日期 2025-06-26 申请号 JP2018563061
公开(公告)号 JP2019522358A 公开(公告)日 2019-08-08
公开国别 JP 申请人省市代码 全国
申请人 IQE plc
简介 A structure can include a III-N layer with a first lattice constant, a first rare earth pnictide layer with a second lattice constant epitaxially grown over the III-N layer, a second rare earth pnictide layer with a third lattice constant epitaxially grown over the first rare earth pnictide layer, and a semiconductor layer with a fourth lattice constant epitaxially grown over the second rare earth pnictide layer. A first difference between the first lattice constant and the second lattice constant and a second difference between the third lattice constant and the fourth lattice constant are less than one percent.


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