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ULTRAVIOLET LIGHT GENERATING TARGET, ELECTRON BEAM EXCITING ULTRAVIOLET LIGHT SOURCE, AND PROCESS 发明申请

2023-06-06 4820 1485K 0

专利信息

申请日期 2025-07-27 申请号 JP2012233973
公开(公告)号 JP2014086255A 公开(公告)日 2014-05-12
公开国别 JP 申请人省市代码 全国
申请人 HAMAMATSU PHOTONICS KK
简介 PROBLEM TO BE SOLVED : To provide an ultraviolet light generating target capable of enhancing ultraviolet light generation efficiency, an electron beam exciting ultraviolet light source, and process of manufacturing the ultraviolet light generating target. SOLUTION : An ultraviolet light generating target 20 includes : a UV-light transmitting substrate 21; a light-emitting layer 22 that is provided on the substrate 21 and generates ultraviolet light UV by receiving an electron beam EB. The light-emitting layer 22 contains a polycrystalline film composed of oxide polycrystal, added with an activator and containing Lu and Si, or a polycrystalline film composed of rare-earth containing aluminum garnet polycrystal, added with an activator. COPYRIGHT : (C)2014, JPO&INPIT


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