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TARGET FOR ULTRAVIOLET LIGHT GENERATION, ELECTRON BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE, AND PRODU 发明申请

2023-02-08 3860 4386K 0

专利信息

申请日期 2026-03-08 申请号 WOJP13074127
公开(公告)号 WO2014065027A1 公开(公告)日 2014-05-01
公开国别 WO 申请人省市代码 全国
申请人 HAMAMATSU PHOTONICS K K
简介 A target for ultraviolet light generation is provided with a substrate that allows ultraviolet light to pass through and a light-emitting layer that is provided on the substrate and that receives an electron beam and generates ultraviolet light (UV). The light-emitting layer comprises a rare earth-containing aluminum garnet crystal that is in powder or granular form and that has an activator added thereto. The ultraviolet light emission peak wavelength of the light-emitting layer is 300 nm or less.


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