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TARGET FOR ULTRAVIOLET LIGHT GENERATION, ELECTRON BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE, AND PRODU 发明申请

2023-03-22 3490 2566K 0

专利信息

申请日期 2025-07-09 申请号 WOJP13074129
公开(公告)号 WO2014065028A1 公开(公告)日 2014-05-01
公开国别 WO 申请人省市代码 全国
申请人 HAMAMATSU PHOTONICS K K
简介 A target for ultraviolet light generation is provided with a substrate that allows ultraviolet light to pass through and a light-emitting layer that is provided on the substrate and that receives an electron beam and generates ultraviolet light. The light-emitting layer includes : a polycrystalline film comprising an oxide polycrystal that contains Lu and Si to which an activator has been added; or a polycrystalline film comprising a rare earth-containing aluminum garnet polycrystal to which an activator has been added.


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