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Inspection apparatus 发明授权

2022-12-31 4730 837K 0

专利信息

申请日期 2025-07-23 申请号 US14236888
公开(公告)号 US8976347B2 公开(公告)日 2015-03-10
公开国别 US 申请人省市代码 全国
申请人 Mizuki Oku; Kei Shimura
简介 Light that is scattered by a defect on a wafer is very weak, and a PMT and an MPPC are used as detection methods for measuring the weak light with high speed and sensitivity. The methods have a function of photoelectronically converting the weak light and multiplying an electron, but have a problem in that a signal light is lost and an S/N ratio is reduced because the quantum efficiency of the photoelectron conversion is as low as 50% or less. Direct light is amplified prior to the photoelectron conversion. The optical amplification is an amplification method in which the signal light and light of pump light are introduced into a rare-earth doped fiber, a stimulated emission is caused, and the signal light is amplified. In the present invention, the optical amplification is used. The amplification factor is changed according to various conditions.


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