| 简介 |
Disclosed are a photomask and a registration correction method thereof. A photomask includes a substrate, photomask patterns on the substrate, and stress generation parts which are formed in the substrate under the photomask patterns to correct the registration error of the photomask patterns. Many stress generation parts can be arranged on the substrate of a low density region where the photomask patterns are rare in comparison with a high density region where the photomask patterns are dense, to correct an exposure latitude (EL) error according to the transmittance decrease of the substrate due to the error correction of the photomask patterns.COPYRIGHT KIPO 2015 |
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