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OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF 发明申请

2023-04-09 1880 70K 0

专利信息

申请日期 2026-04-22 申请号 JP2013162076
公开(公告)号 JP2015032722A 公开(公告)日 2015-02-16
公开国别 JP 申请人省市代码 全国
申请人 NIPPON TELEGR TELEPH CORP ; HOKKAIDO UNIV
简介 PROBLEM TO BE SOLVED : To suppress lowering of luminous efficiency in an optical element using a rare earth compound. SOLUTION : A substrate including a silicon layer 103 cleaned by RCA cleaning is carried in a processing chamber of ultrahigh vacuum of about 1×10-8 Pa, for example, and cleaned by heating up to a temperature of 1000°C or more. Subsequently, it is cooled down to a growth temperature of 700°C. Thereafter, on the principal surface of the silicon layer 103, a material containing rare earth composed of an oxide of rare earth is grown epitaxially in the growth temperature of 700°C by physical vapor deposition, thus forming a light functional layer 104 of single crystal composed of a material containing rare earth. COPYRIGHT : (C)2015, JPO&INPIT


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