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The aluminum nitride substrate, aluminum nitride semiconductor device and a circuit board 发明授权

2023-07-31 4710 248K 0

专利信息

申请日期 2025-06-24 申请号 JP2011505919
公开(公告)号 JP5667045B2 公开(公告)日 2015-02-12
公开国别 JP 申请人省市代码 全国
申请人 TOSHIBA CORPORATION3078; Toshiba Materials Co Ltd303058328
简介 The present invention provides an aluminum nitride substrate and an aluminum nitride circuit board having excellent insulation characteristics and heat dissipation properties and having high strength, a semiconductor apparatus, and a method for manufacturing an aluminum nitride substrate. An aluminum nitride substrate according to the present invention is an aluminum nitride substrate having aluminum nitride as a main component and comprising a polycrystal containing a plurality of aluminum nitride grains, and complex oxide grains being present at grain boundaries of the aluminum nitride grains and including a rare earth element and aluminum, wherein the aluminum nitride grains have a maximum grain size of 10 μm or less, the complex oxide grains have a maximum grain size smaller than the maximum grain size of the aluminum nitride grains, the number of the complex oxide grains having a grain size of 1 μm or more being present in a field of view of 100 μm×100 μm of a surface of the aluminum nitride substrate observed is 40 or more, the aluminum nitride substrate has a bending strength of 400 MPa or more in an unpolished state after firing, and the aluminum nitride substrate has a volume resistivity of 1012 Ωm or more.


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