| 简介 |
PROBLEM TO BE SOLVED : To provide a laminated film which has high denseness with few defects such as fine voids and cracks.
SOLUTION : The laminated film including a substrate and a thin-film layer which is formed on at least one surface of the substrate and contains silicon atoms, oxygen atoms, and carbon atoms is characterized in that the thin-film layer is formed by a plasma chemical vapor deposition method using a raw material gas containing an inorganic silane-based gas, a hydrocarbon-based gas, and an oxygen gas. The thin-film layer is preferably formed using a rare gas, an oxygen gas, or their mixture as a discharge gas.
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