| 简介 |
The present invention refers to, and large in number, the speed polishing, polishing [...] generating and reduced abrasive surface that can realize cerium-based polish provides. The present invention refers to, containing F, Ce and a rare earth element, Y rare earth element other than Ce, La, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, 1 species Lu 14 of rare earth element selected from species (RE *) in cerium-based polish containing, the content of the abrasive in 5.0 ～ 15.0 mass % and F, rare earth oxide before mass of a cerium oxide plurality of NMOS mass terms the ratio of mass 48% ～ 90 mass % and, transistor and a plurality of NMOS mass terms rare earth oxide before, RE * the ratio of oxide mass of 8 mass % ～ 50 mass % and, transistor and a plurality of NMOS mass terms rare earth oxide before, CeO 2 and RE * of the total of the mass the ratio of at least 98 mass %, Y, La, , , 14 of rare earth element in species RE * complicating the structure of the 13 species selected from rare earth element, transistor and a plurality of NMOS mass terms rare earth oxide before, ORE of said 13 for each oxide mass ratio of 0.5 mass % hereinafter is characterized in that the content of. |
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