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METHOD FOR MANUFACTURING SiC SINGLE CRYSTAL 发明申请

2023-06-06 1020 276K 0

专利信息

申请日期 2025-07-30 申请号 JP2017239754
公开(公告)号 JP2019104661A 公开(公告)日 2019-06-27
公开国别 JP 申请人省市代码 全国
申请人 TOYOTA MOTOR CORP
简介 PROBLEM TO BE SOLVED : To provide a method for manufacturing a SiC single crystal, capable of suppressing the contamination of a polycrystal to grow the SiC single crystal. SOLUTION : The method for manufacturing a SiC single crystal includes contacting a SiC seed crystal substrate to a Si-C solution arranged in a graphite crucible and having a temperature gradient dropped to the surface from the inside to grow the SiC single crystal. The Si-C solution includes a solvent constituent element including Si and a rare earth element having a melting point lower than that of Si; the rare earth element is at least one kind selected from a group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy and Yb; the total amount of the rare earth element is 0.5-13.7 at% on the basis of the total amount of the solvent constituent element; and the rare earth element is melted after melting the Si to form the solvent of the Si-C solution. SELECTED DRAWING : Figure 16 COPYRIGHT : (C)2019, JPO&INPIT


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