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TEMPORARY ADHESIVE MATERIAL FOR WAFER PROCESSING, WAFER PROCESSING MEMBER USING THE SAME, WAFER PR 发明申请

2023-05-21 3060 448K 0

专利信息

申请日期 2025-07-09 申请号 KR1020130049640
公开(公告)号 KR1020130125312A 公开(公告)日 2013-11-18
公开国别 KR 申请人省市代码 全国
申请人 SHIN ETSU CHEMICAL CO LTD
简介 The present invention relates to a wafer processing body, a wafer processing member, a temporary adhesive material for wafer processing, and a thin wafer manufacturing method using the same, wherein the wafer processing body maintains cleaning effect after being peeled off and has an appropriate releasing power. The temporary adhesive material for wafer processing according to the present invention includes a first temporary adhesive layer which includes a R21R22R23SiO1/2 unit and a SiO4/2 unit and comprises a thermoplastic resin-modified organopolysiloxane layer and a second temporary adhesive layer which comprises a thermo-cured resin modified siloxane polymer layer.COPYRIGHT KIPO 2014


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