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METHOD FOR PRODUCING SILICON SINGLE CRYSTAL 发明申请

2023-07-05 3960 183K 0

专利信息

申请日期 2026-04-20 申请号 JP2012060179
公开(公告)号 JP2013193896A 公开(公告)日 2013-09-30
公开国别 JP 申请人省市代码 全国
申请人 Siltronic AG
简介 PROBLEM TO BE SOLVED : To provide a method for producing a silicon single crystal capable of suppressing generation of translocation extending from a neck part to a straight body part. SOLUTION : A method for producing a silicon single crystal includes : a preparing step (S10) of preparing a silicon melted liquid; a neck part forming step (S20) of forming a neck part connected with a seed crystal by bringing the seed crystal into contact with the silicon melted liquid; a cutting-off step (S30) of cutting off the neck part from the silicon melted liquid; a cooling step (S40) of lowering the temperature of the neck part cut off from the silicon melted liquid than the temperature of the neck part in the neck part forming step (S20); a regrowing step (S50) of forming a silicon single crystal connected with the neck part by bringing the neck part into contact again with the silicon melted liquid, after the cooling step (S40). COPYRIGHT : (C)2013, JPO&INPIT


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