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Titanium oxide deposition material and its manufacturing method 发明授权

2023-12-11 2820 580K 0

专利信息

申请日期 2025-08-13 申请号 JP2010255675
公开(公告)号 JP5287834B2 公开(公告)日 2013-09-11
公开国别 JP 申请人省市代码 全国
申请人 Nichia Corporation226057
简介 PROBLEM TO BE SOLVED : To provide a titanium oxide based sintered vapor deposition material which has the performance equal to a titanium oxide indicated by a composition formula TiO(1.4≤x≤1.8), is inexpensive, and does not generate fine powder when handled.SOLUTION : The vapor deposition material is a sintered compact including a main component comprising the titanium oxide indicated by the composition formula TiO(1.4≤x≤1.8) and a compound in a garnet structure, or is a sintered compact including the main component comprising the titanium oxide indicated by the composition formula TiO(1.4≤x≤1.8) and at least one kind selected from yttrium oxide, aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide. For the compound in the garnet structure, rare earth aluminum garnet is preferable. For the at least one kind selected from the aluminum oxide, the zirconium oxide, the hafnium oxide and the ytterbium oxide, the aluminum oxide is preferable.


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