客服热线:18202992950

The circuit board and its manufacturing method and the aluminum nitride substrate, semiconductor de 发明授权

2023-02-19 1330 1265K 0

专利信息

申请日期 2025-07-05 申请号 JP2009065624
公开(公告)号 JP5248381B2 公开(公告)日 2013-07-31
公开国别 JP 申请人省市代码 全国
申请人 Toshiba3078; Toshiba Materials Co Ltd303058328
简介 PROBLEM TO BE SOLVED : To provide an aluminum nitride substrate having excellent heat radiation characteristics and a high strength, a method for producing the aluminum nitride substrate, and a circuit board and a semiconductor device. SOLUTION : The aluminum nitride substrate comprises a polycrystalline substance which includes a plurality of aluminum nitride crystal grains and composite oxide crystal grains including a rare-earth element and aluminum and existing at the grain boundary of the aluminum nitride crystal grains. The main component of the aluminum nitride substrate is aluminum nitride. The aluminum nitride crystal grains have an average grain diameter of 5 μm or smaller. The composite oxide crystal grains have an average grain diameter of 5 μm or smaller, a thermal conductivity of 200 W/m*K or higher and a three-point bending strength of 500 MPa or higher. COPYRIGHT : (C)2010, JPO&INPIT


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4