| 申请日期 | 2025-07-09 | 申请号 | KR1020127027345 |
| 公开（公告）号 | KR1020130079348A | 公开（公告）日 | 2013-07-10 |
| 公开国别 | KR | 申请人省市代码 | 全国 |
| 申请人 | IDEMITSU KOSAN CO | ||
| 简介 | In the disclosed deposition method, a target comprising a metal oxide is sputtered and a thin film is deposited on a substrate in a gaseous environment containing rare gas atoms and water molecules, wherein the content of the aforementioned water molecules is 0.1-10% of the aforementioned rare gas atoms by partial pressure ratio. | ||
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