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The method of electrolytic refining of copper 发明授权

2023-09-08 4490 69K 0

专利信息

申请日期 2026-03-10 申请号 JP2009227739
公开(公告)号 JP5213828B2 公开(公告)日 2013-06-19
公开国别 JP 申请人省市代码 全国
申请人 Pan Pacific Copper Co Ltd500483219
简介 PROBLEM TO BE SOLVED : To provide a method for electrolytically refining copper, which can remove a thin film (copper compound layer) that deposits on the surface of electrodeposited copper. SOLUTION : The method for electrolytically refining copper is directed for electrolytically refining copper by immersing the first electrode and the second electrode made from crude copper in an electrolytic tank which accommodates an electrolytic solution therein, and includes : the step (S1) of setting the first electrode 13 as a cathode and the second electrode 12 as an anode, and passing the first electric current between the first electrode 13 and the second electrode 12 to make an electrodeposited copper layer 6 deposit on the surface of the first electrode 13; the step (S2) of turning the first electric current off; the step (S3) of setting the first electrode 13 as the anode and the second electrode 12 as the cathode, after a predetermined period of time has passed after the first electric current has been turned off, and passing the second electric current between the first electrode 13 and the second electrode 12 to remove the copper compound layer formed on the electrodeposited copper layer 6 therefrom; and the step (S4) of setting the first electrode 13 as the cathode and the second electrode 12 as the anode, and passing the third electric current between the first electrode 13 and the second electrode 12 to make a re-electrodeposited copper layer 7 electrolytically deposit on the surface of the electrodeposited copper layer 6. COPYRIGHT : (C)2011, JPO&INPIT


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