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Electroless plating bath temp. device using the same and method of manufacturing 发明授权

2023-08-30 4530 228K 0

专利信息

申请日期 2025-06-24 申请号 JP2008085711
公开(公告)号 JP5210017B2 公开(公告)日 2013-06-12
公开国别 JP 申请人省市代码 全国
申请人 Ebara Corporation239
简介 There is provided an electroless plating bath which makes it possible to form a diffusion barrier layer of a Re-based alloy, having a uniform thickness regardless of the shape and size of a workpiece; on the surface of a Ni-based alloy by a relatively simple method. The electroless plating bath for forming a Ni-Re-B alloy, containing not less than 50 at% of Re, on a substrate by electroless plating, has a pH of 6 to 8 and includes a metal supply source component containing Ni 2+ and ReO 4 - at an equal equivalent in the range of 0.01 to 0.5 mol/L, a complexing agent component containing citric acid and at least one other organic acid, and a reducing agent component containing dimethylamine-borane.


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