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PRETREATING METHOD, GRAPHENE FORMING METHOD AND GRAPHENE PRODUCTION APPARATUS 发明申请

2023-08-23 1160 2295K 0

专利信息

申请日期 2025-07-02 申请号 JP2011245747
公开(公告)号 JP2013100205A 公开(公告)日 2013-05-23
公开国别 JP 申请人省市代码 全国
申请人 TOKYO ELECTRON LTD
简介 PROBLEM TO BE SOLVED : To provide a method of causing high-crystallinity and good-quality graphene to grow efficiently at temperatures as low as possible. SOLUTION : Prior to growth of graphene, a pretreatment is carried out. The pretreatment includes introducing a rare gas from a shower ring 57 into a treatment container 1 while operating an exhaust device 99 to vacuumize the inside of the treatment container 1 and simultaneously introducing a reducing gas and a nitrogen-containing gas from a shower plate 59 into the treatment container 1. Under such conditions, microwaves generated in a microwave generation section 35 are guided in a predetermined mode to a planar antenna 33 through a waveguide 47 and a coaxial waveguide 49 and introduced into the treatment container 1 through a microwave radiation hole 33a and a transmission plate 39 of the planar antenna 33. The reducing gas and the nitrogen-containing gas are converted into plasma by the microwaves, and the plasma activates the catalyst metal layer of the surface of a wafer W. COPYRIGHT : (C)2013, JPO&INPIT


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