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Cu-Mg-P BASED COPPER ALLOY MATERIAL AND METHOD OF PRODUCING THE SAME 发明授权

2023-01-15 4720 357K 0

专利信息

申请日期 2025-08-18 申请号 KR1020100062716
公开(公告)号 KR101260720B1 公开(公告)日 2013-04-29
公开国别 KR 申请人省市代码 全国
申请人 MITSUBISHI SHINDOH CO LTD
简介 Non-elastic yarn and an elastic tensile strength (purpose) scheduled balance level pushed Mg-P-cu provides manufacturing method and copper alloy. (Constitution) to mass %, mg : 0.3-2%, P : 0.001-0.1%, cu and unavoidable impurities with the balance copper alloy having composition which re-trillion , the backscatter electron diffraction as a matter of system with by EBSD by scanning type electron microscope, said copper alloy trillion re- measurement of surface measures a orientation of all the pixels transistors, 5° difference orientation between adjacent pixel in the crystal grain boundary boundary it is an above grain when considered in all the pixels in the average orientation difference between less than 4° and having a grain has an area ratio of said measuring area 45-55% and, sheet having a tensile strength of 641-708N/mm 2 is, elastic pushed 472-503N/mm 2 is.


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