| 申请日期 | 2025-07-07 | 申请号 | US15329478 |
| 公开（公告）号 | US10294585B2 | 公开（公告）日 | 2019-05-21 |
| 公开国别 | US | 申请人省市代码 | 全国 |
| 申请人 | TDK CORPORATION | ||
| 简介 | An alumina substrate wherein an AlN layer is formed on a surface of the alumina substrate and a rare earth elements-containing layer and/or rare earth elements-containing regions is/are formed in the interior of the AlN layer or in the interface between the AlN layer and the alumina substrate. | ||
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